Draft:Bacus
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| Founded | 1980 |
|---|---|
| Type | Professional organization |
| Focus | Photomask Technology |
BACUS (originally Bay Area Chromium Users Society) is a Technical Group of SPIE, the International Society of Optics and Photonics. It supports the development of photomask technologies used in semiconductor manufacturing, primarily through its management of the Photomask Technology and EUV Lithography ("PUV") Symposium.[1]
History
[edit]BACUS was established in 1980 by a group of photomask professionals in Silicon Valley. The founding meeting took place at the Bacchus Inn in Santa Clara, California, where attendees discussed common issues in photomask technology and decided to organize a symposium to address them.[2] The following year, BACUS held its first symposium on photomasks and mask making in Sunnyvale, CA. Ten users, including AMI (now Onsemi), Ultratech, Master Images, Signetics, National Semiconductor, IBM, Micromask, Microfab, Hewlett Packard and Fairchild, presented chrome blank user requirements to the vendor community.[3]
In 1991, BACUS became a Technical Group of SPIE, facilitating broader collaboration within the photomask community.[4]
In 2005, the 25th annual BACUS Photomask Technology symposium was held in Monterey, Calif. with 1,154 attendees and almost 200 papers presented.[5][6]
In 2017, BACUS was co-located with the EUV Lithography Conference, together referred to as the SPIE PUV Symposium.[7]
In 2024, the PUV conference highlighted the significant progress being made in EUV lithography and photomask technology.[8]
Awards
[edit]BACUS issues several awards annually.[9] Awards and a selection of recipients are listed below.
- Lifetime Achievement Award - To recognize an individual who, during their lifetime, have made distinct contributions of outstanding business or technical significance to the photomask industry.
| Year | Name | Citation | Ref |
|---|---|---|---|
| 2012 | Richard Ole Larson of Toppan Photomask | In Recognition for his Contributions to the Photomask Industry 1973 – 2008 and to Honor his actions exemplifying: Leadership by Example, Mentoring, and Operations Excellence. | [10] |
| 2013 | Deno Macricostas, founder of Photronics | For for his dedication to customer service, strategic acquisitions and partnerships. | [11] |
| 2017 | Dr. Hiroaki Morimoto of Mitsubishi Electronics | Highlights of his work include the ion beam repair system that was commercialized by Seiko Instrument and the invention of the attenuated phase-shifting mask with a single-layer absorptive shifter which is still used in production. | BACUS News, October 2017, Vol. 33, Issue 10[12] |
| 2018 | Frank Abboud | For his thirty+ years of significant contributions in all areas of photomask technology, more specifically for his leadership in the development of advanced e-beam pattern generation. | BACUS News, October 2018, Vol. 34, Issue 11[12] |
| 2021 | Ken Rygler of Rygler and Associates | For influencing the entry of the E.I. Dupont Company into the merchant mask business in the 1980's. | [13][14] |
| 2024 | Hans Loeschner of IMS Nanofabrication | In recognition of his contributions toward the development of the IMS electron multi-beam mask-writer (MBMW) technology. | [15] |
- BACUS Award - To recognize outstanding contributions to the photomask industry that have at least one of the following attributes: a fundamental change or innovation, an enduring contribution, and/or an enabling contribution.
- 2023: Haruhiko Kusunose of Lasertec Corporation in recognition of "The enablement of EUV mask inspection using 193nm optical inspection system"[16]
- Photomask Technology Conference Best Presentation- To recognize an outstanding oral presentation and research, this recognition is awarded at the chairs' discretion, typically by committee vote. Presentations are judged on three criteria: technical impact, scientific analysis, and delivery/presentation.
- 2018: Dr. Scott Lewis for his presentation "Design and implementation of the next-generation electron-beam resists for the production of EUVL photomasks"[17]
- 2023: Toshiyuki Todoroki and Kou Gondaira of Lasertec Corporation for their paper, "Actinic pattern mask inspection for high-NA EUV lithography"[16]
- Photomask Technology Conference Best Poster - To recognize an outstanding poster presentation and research, recognition is awarded at the chairs' discretion, typically by committee vote.
- 2018: Hayden Alty for his poster "Using 3D Monte Carlo simulation to develop resists for next-generation lithography"[17]
Publications
[edit]Conference Proceedings[18] are published by SPIE and cover a wide range of topics in photomask technology. SPIE also archives BACUS newsletters published from 2010-2023.[12]
- Connecting climate with photomasks: Using skills for good by Emily Gallagher of Imec[19]
- Translating e-beam-litho performance to optical specification by Vistec[20]
References
[edit]- ^ "SPIE BACUS Technical Group". spie.org. Retrieved 2025-04-10.
- ^ Wiley, Jim (October 29, 2018). "Early Silicon Valley Mask Making & BACUS Founding". Medium. Retrieved April 25, 2025.
- ^ "Front Matter: Volume PM81". Bay Area Chrome Users Society Symposium 1981. SPIE. 2023-10-05. p. 0. doi:10.1117/12.3009927. ISBN 978-1-5106-6866-9.
- ^ Levinson, Harry (2023). "Long Live BACUS!". Journal of Micro/Nanopatterning, Materials, and Metrology. 22 (4): 040101. Bibcode:2023JMNMM..22d0101L. doi:10.1117/1.JMM.22.4.040101 – via SPIE Digital Library.
- ^ McGrath, Dylan (2005-10-07). "Design, manufacturing worlds collide at Bacus". EDN. Retrieved 2025-06-05.
- ^ McGrath, Dylan (2005-10-07). "Design, manufacturing worlds collide at Bacus". EE Times. Retrieved 2025-06-19.
- ^ Willis, Jan (2017-08-17). "What's Changing At BACUS". Semiconductor Engineering. Retrieved 2025-04-10.
- ^ Levinson, Harry (2024-12-04). "Takeaways From The 2024 SPIE Photomask Technology + EUV Conference". Semiconductor Engineering. Retrieved 2025-04-24.
- ^ "Photomask Technology + EUV Lithography awards". spie.org. Retrieved 2025-04-14.
- ^ "In memoriam: Rich Larson". spie.org. Retrieved 2025-05-09.
- ^ SPIE. "Industry Leaders Drive SPIE Photomask Technology Conference". www.prweb.com. Retrieved 2025-05-09.
- ^ a b c "BACUS News". spie.org. Retrieved 2025-04-10.
- ^ "I was honored to receive the Lifetime Achievement Award from the BACUS... | Ken Rygler | 67 comments". www.linkedin.com. Retrieved 2025-06-09.
- ^ "Ken Rygler receives 2021 Bacus Lifetime Achievement award". spie.org. Retrieved 2025-06-09.
- ^ ims-admin-2024 (2024-10-22). "BACUS 2024 Lifetime Achievement Award for IMS Co-Founder Hans Loeschner". IMS Nanofabrication GmbH. Retrieved 2025-06-09.
{{cite web}}: CS1 maint: numeric names: authors list (link) - ^ a b "Lasertec Receives "BACUS Prize" and "Best Paper Presentation Award" at SPIE Photomask Technology + EUVL Exhibition 2023". Lasertec Corporation. Retrieved 2025-06-05.
- ^ a b "KNI Collaborators Win Two Awards at 2018 SPIE Photomask Technology + EUV Lithography Conference". The Kavli Nanoscience Institute. 2018-10-12. Retrieved 2025-06-19.
- ^ "SPIE Digital Library Photomask Technology Proceedings". www.spiedigitallibrary.org. Retrieved 2025-06-05.
- ^ "Connecting climate with photomasks: Using skills for good | Electro Optics". www.electrooptics.com. Retrieved 2025-06-19.
- ^ "Meet us at Bacus Photomask Technology 2024 in Monterey, CA". www.vistec-semi.com. 2024-09-24. Retrieved 2025-06-05.
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