Wikipedia:Articles for deletion/Electromagnetically enhanced Physical Vapor Deposition
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- Electromagnetically enhanced Physical Vapor Deposition (edit | talk | history | protect | delete | links | watch | logs | views) – (View log | edits since nomination)
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Page that describes (advertises) a not notable product by a company, used for Physical vapor deposition. The technique is standard, with a decent general page already at Low-energy plasma-enhanced chemical vapor deposition, which is what the page was redirected to -- this company did not invent it and their technology is not special. An editor who is presumably not aware of the science/technology recreated the page. Going to AfD rather than an edit war. Ldm1954 (talk) 11:14, 22 May 2025 (UTC)
- Note: This discussion has been included in the deletion sorting lists for the following topics: Products, Science, and Engineering. Ldm1954 (talk) 11:14, 22 May 2025 (UTC)
- Comment. Both the page (in its original and current version) as well as the companies web page fails to describe the method. The page has one reference to magnetron deposition in [5], which indicates that a standard plasma deposition method is used. There must be a plasma, as electromagnetic fields of course do not have any effect on neutral atoms. Both the original and current version are from a technical viewpoint at best a bit misleading. (Admittedly the reverting editor has probably never done thin film deposition work.) Ldm1954 (talk) 16:51, 22 May 2025 (UTC)
- Delete Lacking in independent sources that describe the process. This just seems to be a trademarked name of what may or may not be low-energy plasma enhanced CVD. Difficult to verify anything given the process's proprietary nature. Anonrfjwhuikdzz (talk) 15:59, 23 May 2025 (UTC)
- KeepThere are independent coverages which helps establish the technology’s notability and neutral evaluation. For example, an article in The Globe and Mail provides coverage from a widely respected national newspaper and discusses Canadian defense technology and its international impact. Similarly, a piece on Global Defence Technology via NRIDigital offers an industry perspective that includes technical comparisons with traditional chrome plating—this demonstrates that the discussion of EPVD is carried out by independent experts rather than serving as self‐promotion.
- Additional third‑party analysis is available from and Security, which supports the claims made in the article by providing market context and independent observations. Moreover, coverage by Shephard Media further reinforces the technology’s relevance by detailing how innovations like EPVD can enhance the longevity and precision of weapons systems. Beyond media coverage, government validation also substantiates EPVD’s impact. For instance, a SERDP/ESTCP fact sheetsupports this by offering government-backed details of the technology’s performance and significance. In addition, a contract listing on [1] shows that public sector interest and evaluations have been directed toward EPVD, addressing concerns about promotional bias through independent evidence.
- Lastly, EPVD is clearly differentiated from other deposition methods such as low‑energy plasma‑enhanced chemical vapor deposition. In the wake of the EU’s ban on chrome plating, an analysis by the European Chemicals Agency (ECHA)indicates that EPVD has become a viable alternative to chrome plating.
- Pointing that, I believe this article is neutral, independently verified and not an advertisement—and should remain active on Wikipedia. — Preceding unsigned comment added by Benyamin21 (talk • contribs) 07:46, 28 May 2025 (UTC)