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BACUS
[edit]| Founded | 1981 |
|---|---|
| Type | Professional organization |
| Focus | Photomask Technology + EUV Lithography |
BACUS (Bay Area Chrome Users Society) is an international professional organization for semiconductor mask makers, materials and equipment suppliers, and mask users. BACUS is dedicated to advancing photomask technology and semiconductor manufacturing. As a technical group of SPIE, the International Society of Optics and Photonics, it serves as a hub for experts in photomask technology, EUV lithography, and related fields.:[1]
History
[edit]BACUS was established in 1980 by a group of photomask professionals in Silicon Valley, including Jim Wiley, who was a key figure in its inception. The founding meeting took place at the Bacchus Inn in Santa Clara, California, where attendees discussed common issues in photomask technology and decided to organize a symposium to address them. The name "BACUS" was chosen as a playful nod to the Bacchus Inn. [2] The engineers, entrepreneurs, and researchers located there, worked to extend the use of chromium-based photomasks exposed with optical lithography tools to pattern features of integrated circuits with dimensions increasingly more below the wavelength of the exposure light. This effort, fueling the growth of semiconductor industry, provided the identifier to the group. BACUS held its first symposium on photomasks and mask making in Sunnyvale, CA in 1981. In 1991, BACUS became a Technical Group of SPIE, facilitating broader collaboration within the photomask community.
Evolution and Challenges
[edit]Harry Levinson discusses BACUS earlier years, challenges and development and how it became engaged with SPIE.[3] The value of conferences and professional societies, as explained in an early symposium, "as opportunities for lithographers to coordinate aspects of lithographic technology that do not provide a competitive advantage to any particular company and where synchronization can lead to great manufacturing efficiencies," still holds today.
Conference
[edit]BACUS holds its annual Photomask Technology Conference in Monterey, CA. The conference is co-located with the EUV Lithography Conference, together referred to as the SPIE PUV Symposium.[4] The annual conference brings together experts and professionals in photomask technology and EUV lithography[5]. Guidelines for the 2025 conference are available on-line.[6]
Webinars
[edit]BACUS holds quarterly webinars[7] viewable with SPIE account. Most recently Vivek Singh of NVIDIA recorded a webinar on AI and AC for Silicon Leadership.[1] Other recorded webinars include:
- NA EUV - Extreme Ultraviolet Lithography Optics on the Next Level, Paul Graupner from Carl Zeiss SMT
- Manufacturing Limitations And Their Mitigation in AR/VR Photonics Devices, Larry Melvin from Synopsys
- Fundamentals of EUV Masks And Implications On Phase Shift Technology, Patrick Nauleau from EUV Tech
- Overview of Photomask Technology, Glen Scheid from Micron Technology
Awards
[edit]BACUS issues several awards annually[8]
- Lifetime Achievement Award - To recognize an individual who, during their lifetime, have made distinct contributions of outstanding business or technical significance to the photomask industry
- BACUS Award - To recognize outstanding contributions to the photomask industry that have at least one of the following attributes: a fundamental change or innovation, an enduring contribution, and/or an enabling contribution
- Photomask Technology Conference Best Paper - To recognize an outstanding oral presentation and research, this recognition is awarded at the chairs' discretion, typically by committee vote. Presentations will be judged on three criteria: technical impact, scientific analysis, and delivery/presentation.
- Photomask Technology Conference Best Poster - To recognize an outstanding poster presentation and research, recognition is awarded at the chairs' discretion, typically by committee vote.
Publications
[edit]Conference Proceedings are published by SPIE and cover a wide range of topics in photomask technology. Notable examples include:
- Process Development for 257-nm Photomask Fabrication: This paper discusses the development of a deep ultraviolet (DUV) photoresist process for mask fabrication, highlighting improvements in resolution and stability.[13]
- DUV Laser Lithography for Photomask Fabrication: This study explores the use of chemically amplified resists in DUV printing for photomask fabrication, addressing challenges like CD degradation and standing wave effects.[14]
BACUS previously published a regular newsletter which is now archived[15]
- ^ "SPIE BACUS Technical Group". spie.org. Retrieved 2025-04-10.
- ^ Wiley, Jim (October 29, 2018). "Early Silicon Valley Mask Making & BACUS Founding". Medium. Retrieved April 25, 2025.
- ^ Levinson, Harry (2023). "Long Live BACUS!". Journal of Micro/Nanopatterning, Materials, and Metrology. 22 (4): 040101. Bibcode:2023JMNMM..22d0101L. doi:10.1117/1.JMM.22.4.040101 – via SPIE Digital Library.
- ^ Willis, Jan (2017-08-17). "What's Changing At BACUS". Semiconductor Engineering. Retrieved 2025-04-10.
- ^ Levinson, Harry (2024-12-04). "Takeaways From The 2024 SPIE Photomask Technology + EUV Conference". Semiconductor Engineering. Retrieved 2025-04-24.
- ^ "Photomask Technology 2025". spie.org. Retrieved 2025-04-12.
- ^ "Photomask and Lithography past webinars". spie.org. Retrieved 2025-04-24.
- ^ "Photomask Technology + EUV Lithography awards". spie.org. Retrieved 2025-04-14.
- ^ ims-admin-2024 (2024-10-22). "BACUS 2024 Lifetime Achievement Award for IMS Co-Founder Hans Loeschner". IMS Nanofabrication GmbH. Retrieved 2025-05-09.
{{cite web}}: CS1 maint: numeric names: authors list (link) - ^ "I was honored to receive the Lifetime Achievement Award from the BACUS… | Ken Rygler | 67 comments". www.linkedin.com. Retrieved 2025-05-09.
- ^ SPIE. "Industry Leaders Drive SPIE Photomask Technology Conference". www.prweb.com. Retrieved 2025-05-09.
- ^ "In memoriam: Rich Larson". spie.org. Retrieved 2025-05-09.
- ^ Albelo, Jeff A.; Rathsack, Benjamen M.; Pirogovsky, Peter Y. (2001). Grenon, Brian J.; Dao, Giang T. (eds.). "Process development for 257-nm photomask fabrication using environmentally stable chemically amplified photoresists". SPIE Digital Library. 20th Annual BACUS Symposium on Photomask Technology. 4186: 73. Bibcode:2001SPIE.4186...73A. doi:10.1117/12.410734.
- ^ Jackson, Curt A.; Buck, Peter; Cohen, Sarah; Garg, Vishal; Howard, Charles; Kiefer, Robert; Manfredo, John; Tsou, James (2003). Kimmel, Kurt R.; Staud, Wolfgang (eds.). "DUV laser lithography for photomask fabrication". SPIE Digital Library. 23rd Annual BACUS Symposium on Photomask Technology. 5256: 30. Bibcode:2003SPIE.5256...30J. doi:10.1117/12.518269.
- ^ "BACUS News". spie.org. Retrieved 2025-04-10.