Jump to content

Plasma processing

From Wikipedia, the free encyclopedia
This is an old revision of this page, as edited by Dankarl (talk | contribs) at 14:49, 7 February 2014 (corona). The present address (URL) is a permanent link to this revision, which may differ significantly from the current revision.

Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.

Plasma processing techniques include:

Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.

See also