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Plasma processing

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This is an old revision of this page, as edited by Art Carlson (talk | contribs) at 12:59, 5 May 2005 (Category:Plasma processing). The present address (URL) is a permanent link to this revision, which may differ significantly from the current revision.

Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.

Plasma processing techniques include:

Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputtering, plasma ion doping, and reactive ion etching.