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Direct laser interference patterning

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In materials science, direct laser interference patterning (DLIP) is a laser-based method of creating repetitive patterns on the surface of materials by using the interference phenomenon of two or more laser beams.[1][2] In order to obtain interference, the beam is divided by a beam splitter, special prisms,[3] or other elements. The beams are then folded together to form an interference pattern. Sufficiently high power of the laser beam can thus result in the removal of material at the interference maximums thanks to ablation phenomenon, leaving the material intact at the minimums. In this way, a repeatable pattern can be permanently fixed on the surface of a given material.[citation needed]

Advantages of the method

  • It is possible to create microstructures directly on the material on a scale much larger than in the case of direct laser writing (DLW). The image created as a result of interference can have dimensions on the order of single centimeters, which enables the creation of a large surface structure in a single step.
  • Another advantage is that the number of elements in the experimental setup is reduced due to the interference phenomenon.
  • The dimensions of the microstructure can be on the order of 100 nm, which is not achievable with direct laser writing.

Types of interferometers

There are many ways to separate the laser beam, including interferometers based on:

References

  1. ^ Yu, Fayou; Li, Ping; Shen, Hao; Mathur, Sanjay; Lehr, Claus-Michael; Bakowsky, Udo; Mücklich, Frank (2005-05-01). "Laser interference lithography as a new and efficient technique for micropatterning of biopolymer surface". Biomaterials. 26 (15): 2307–2312. doi:10.1016/j.biomaterials.2004.07.021. PMID 15585233.
  2. ^ a b Czyż, Krzysztof; Marczak, Jan; Major, Roman; Mzyk, Aldona; Rycyk, Antoni; Sarzyński, Antoni; Strzelec, Marek (August 2016). "Selected laser methods for surface structuring of biocompatible diamond-like carbon layers". Diamond and Related Materials. 67: 26–40. Bibcode:2016DRM....67...26C. doi:10.1016/j.diamond.2016.01.013.
  3. ^ a b Czyż, Krzysztof (2016-08-05). "The influence of surface topography elaborated by prism optics based laser interference modification on cell differentiation". Inżynieria Materiałowa. 1 (4): 10–16. doi:10.15199/28.2016.4.2.
  4. ^ Divliansky, Ivan B.; Shishido, Atsushi; Khoo, Iam-Choon; Mayer, Theresa S.; Pena, David; Nishimura, Suzushi; Keating, Christine D.; Mallouk, Thomas E. (2001-11-19). "Fabrication of two-dimensional photonic crystals using interference lithography and electrodeposition of CdSe". Applied Physics Letters. 79 (21): 3392–3394. Bibcode:2001ApPhL..79.3392D. doi:10.1063/1.1420584. ISSN 0003-6951.
  5. ^ Hauschwitz, Petr; Jochcová, Dominika; Jagdheesh, Radhakrishnan; Cimrman, Martin; Brajer, Jan; Rostohar, Danijela; Mocek, Tomáš; Kopeček, Jaromír; Lucianetti, Antonio; Smrž, Martin (January 2020). "Large-Beam Picosecond Interference Patterning of Metallic Substrates". Materials. 13 (20): 4676. Bibcode:2020Mate...13.4676H. doi:10.3390/ma13204676. PMC 7590036. PMID 33092278.
  6. ^ Boor, Johannes de; Geyer, Nadine; Gösele, Ulrich; Schmidt, Volker (2009-06-15). "Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning". Optics Letters. 34 (12): 1783–1785. Bibcode:2009OptL...34.1783D. doi:10.1364/OL.34.001783. ISSN 1539-4794. PMID 19529702.
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